We use Pulsed laser deposition (PLD) to grow various complex oxide thin films. Currently we are focusing on high-k dielectric epitaxial films.

We use water soluble sacrificial layer, and buffer-free exfoliation to make freestanding oxide thin films with thicknesses ranging from few nms to several hundreds of nanometers. These can later be integrated into flexible, light-weight devices.

Understanding the physical properties starts from looking the material at an atomic scale with scanning transmission electron microscopy (STEM). Single vacancy or dislocations may sound trivial but it can largely impact the material’s properties.